Glow discharge processes : sputtering and plasma etching / Brian N. Chapman.
Material type:
TextLanguage: English Publication details: New York : Wiley, ©1980. Description: xv, 406 p. : ill. ; 24 cmISBN: 047107828X; 9780471078289Subject(s): Sputtering (Physics) | Glow discharges | Plasma etchingDDC classification: 537.52
| Item type | Current library | Home library | Call number | Copy number | Status | Date due | Barcode | Item holds |
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Central Library, TU Textbook Section (Consult Shelf-Guide to locate the book) | Central Library, TU | 537.52 CHA (Browse shelf(Opens below)) | 1 | Available | 91400 |
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| 537.5 YAR Quantum electronics / | 537.5 YAR Quantum electronics / | 537.5 YAR Quantum electronics / | 537.52 CHA Glow discharge processes : | 537.53 RAI Gas discharge physics / | 537.53 RAI Gas discharge physics / | 537.53 RAI Gas discharge physics / |
"A Wiley-Interscience publication."
Includes index.
Bibliography: p. 397-400.
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